This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003-2005.
Company Filing History:
Years Active: 2003-2005
Title: Innovations of Feng-Yueh Chang
Introduction
Feng-Yueh Chang is a notable inventor based in Banchiau, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods in plasma etching and polymer deposition. With a total of 2 patents, his work has advanced the technology used in the semiconductor industry.
Latest Patents
Feng-Yueh Chang's latest patents include a method to improve via or contact hole profile using an in-situ polymer deposition and strip procedure. This method involves forming a narrow diameter opening in an insulator layer with a vertical shape profile. The process utilizes a photoresist shape as an etch mask, employing a first plasma procedure to create an initial opening with a tapered profile. A thin polymer layer is formed at the bottom of this opening, followed by a second plasma procedure that deposits additional polymer. Finally, a third plasma procedure in an oxygen plasma removes the polymer, resulting in a final opening with a vertical profile shape.
Another significant patent is the plasma etching method to form dual damascene with improved via profile. This method enhances the etching profile of semiconductor features by anisotropically etching a second feature opening that partially encompasses the first feature opening. The process includes plasma treating both openings with a mixture of oxygen and nitrogen plasma source gases, which effectively removes unetched portions.
Career Highlights
Feng-Yueh Chang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has positioned him as a key player in the development of advanced manufacturing techniques. His innovative approaches have contributed to the efficiency and effectiveness of semiconductor production.
Collaborations
Feng-Yueh Chang has collaborated with notable colleagues, including Jyh-Shiou Hsu and Pin-Yi Hsin. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Feng-Yueh Chang's contributions to semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance in the industry. His work continues to influence advancements in technology, making a significant impact on the future of semiconductor production.