Feng-Lun Wu

Title: Feng-Lun Wu: Innovator in Semiconductor Manufacturing

Introduction

Feng-Lun Wu is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a patent that showcases his innovative approach to device fabrication. His work is essential in advancing technology in the semiconductor industry.

Latest Patents

Feng-Lun Wu holds a patent titled "Method for manufacturing semiconductor device." This invention outlines a comprehensive method for creating semiconductor devices, which includes several critical steps. The process begins with providing a substrate, a hard mask layer on the substrate, and a first mask pattern on the hard mask layer. The substrate features a device region and a cutting line region. The first mask pattern contains first gaps in the device region and second gaps in the cutting line region. Following this, a spacer layer is conformally applied over the first mask pattern. A second mask pattern is then formed on the spacer layer within the first gaps, ensuring that the top surface of the second mask pattern is lower than that of the first mask pattern. Finally, an etching process is executed to remove the spacer layer between the first and second mask layers and in the second gaps, exposing the hard mask layer.

Career Highlights

Feng-Lun Wu has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and Fujian Jinhua Integrated Circuit Co., Ltd. His experience in these organizations has contributed to his expertise and innovation in semiconductor device manufacturing.

Collaborations

Feng-Lun Wu has collaborated with notable professionals in his field, including Chien-Hao Chen and Chung-Ping Hsia. These collaborations have likely enhanced his work and contributed to the development of advanced semiconductor technologies.

Conclusion

Feng-Lun Wu is a distinguished inventor whose contributions to semiconductor manufacturing are noteworthy. His patent reflects a deep understanding of the complexities involved in creating efficient semiconductor devices. His work continues to influence the industry and drive innovation forward.