Felix H Fujishiro

Title: **Innovator Spotlight: Felix H. Fujishiro**

Introduction

Felix H. Fujishiro is a notable inventor based in San Jose, CA, recognized for his contributions to the field of integrated circuit manufacturing. With a total of 10 patents to his name, Fujishiro has focused on innovative methods that enhance the efficiency and quality of semiconductor devices.

Latest Patents

One of his latest patents, titled **"Integrated Circuit Manufacture Method with Aqueous Hydrogen Fluoride and Nitric Acid Oxide Etch,"** outlines a novel approach to replace contaminated oxide layers with relatively pure oxide during the manufacturing process of integrated circuits. The method utilizes several key steps: first, a partially manufactured integrated circuit is immersed in an aqueous solution of hydrogen peroxide and ammonium hydroxide, which oxidizes organic materials and weakens metal contaminants' bonds to the substrate. An aqueous rinse follows this step to eliminate the oxidized materials and contaminants. Next, the circuit undergoes treatment in an aqueous solution of hydrogen fluoride and nitric acid, where the hydrogen fluoride etches away the contaminated oxide while the nitric acid reacts with the freed calcium and metal contaminants to form soluble nitride byproducts that can be easily rinsed away. This process is completed by a drying step and an oxide formation step to ensure a relatively pure oxide layer is achieved.

Career Highlights

Throughout his career, Felix H. Fujishiro has made significant strides in the semiconductor industry, with an impressive record of professional involvement with companies like VLSI Technology, Inc. and Koninklijke Philips Corporation N.V. His work has not only advanced the techniques used in integrated circuit manufacturing but also contributed to the overall enhancement of product quality in the technology sector.

Collaborations

Fujishiro has collaborated with various talented professionals during his career. Notable among his coworkers are Landon B. Vines and Chang-Ou Lee, who have contributed to the innovative projects and developments in which Fujishiro has been involved. These collaborations have fostered an environment of creativity and cross-pollination of ideas, pushing the boundaries of semiconductor technology.

Conclusion

Felix H. Fujishiro is a prominent figure in the field of integrated circuit manufacturing, with a commendable portfolio of patents that showcases his innovative spirit and technical expertise. His methods and collaborations have played a vital role in shaping advancements in the semiconductor industry, solidifying his position as a revered inventor whose work continues to impact technology today.