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For the Inventor, By the Inventor

Fremont, CA, United States of America

Feiyue Li

USPTO Granted Patents = 8 

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 118(Granted Patents)


Location History:

  • Fremont, CA (US) (2011 - 2016)
  • Newark, CA (US) (2024)

Company Filing History:

goldMedal8 out of 1,214 
 
Headway Technologies, Incorporated
 patents

Years Active: 2011-2025

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8 patents (USPTO):Explore Patents
1. 12437778 - Electroplating of high damping material for trailing shield in a perpendicular magnetic recording writer (2025-10-07),
2. 11978488 - Electroplating of high damping material for trailing shield in a perpendicular magnetic recording writer (2024-05-07),
3. 9466319 - Perpendicular magnetic recording (PMR) write shield design with minimized wide adjacent track erasure (WATE) (2016-10-11),
4. 8568909 - Electrodeposition of FeCoNiV films with high resistivity and high saturation magnetization (2013-10-29),
5. 8345383 - Method to make an integrated side shield PMR head with non-conformal side gap (2013-01-01),
6. 8177955 - Electrodeposition of FeCoNiV films with high resistivity and high saturation magnetization for magnetic head fabrication (2012-05-15),
7. 8118990 - Electroplated magnetic film for read-write applications (2012-02-21),
8. 8031433 - Method to make an integrated side shield PMR head with non conformal side gap (2011-10-04),

Title: The Innovative Journey of Feiyue Li

Introduction: Feiyue Li, a visionary inventor based in Fremont, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Feiyue Li holds several patents in the areas of artificial intelligence, renewable energy, and advanced robotics, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a background in engineering and a passion for pushing the boundaries of what is possible, Feiyue Li has led successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout his career, Feiyue Li has collaborated with leading tech companies, research institutions, and universities to bring his ideas to life and create real-world solutions to complex challenges.

Conclusion: Feiyue Li's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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