The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Sep. 22, 2011
Cherng-chyi Yan, San Jose, CA (US);
Feiyue LI, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Jiun-ting Lee, Sunnyvale, CA (US);
Yoshitaka Sasaki, Santa Clara, CA (US);
Cherng-Chyi Yan, San Jose, CA (US);
Feiyue Li, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Jiun-Ting Lee, Sunnyvale, CA (US);
Yoshitaka Sasaki, Santa Clara, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.