The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Sep. 08, 2015
Headway Technologies, Inc., Milpitas, CA (US);
Yuhui Tang, Milpitas, CA (US);
Yaguang Wei, Pleasanton, CA (US);
Yue Liu, Fremont, CA (US);
Moris Dovek, San Jose, CA (US);
Xiaomin Liu, Fremont, CA (US);
Feiyue Li, Fremont, CA (US);
Po-Kang Wang, Los Altos, CA (US);
Luc Thomas, San Jose, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A Perpendicular Magnetic Recording (PMR) writer is disclosed with an all wrap around (AWA) shield design in which one or more of the leading shield, second trailing shield, and side shields consist of a high damping (HD) magnetic material having a damping constant ≧0.04. A first trailing shield between the write gap and second trailing shield is a 19-24 kG hot seed layer. The HD magnetic layer may be FeNiRe with a Re content of 3 to 15 atomic %. Preferably, the HD magnetic layer has a coercivity <50 Oe and is a 10-19 kG material. One or both of the main pole leading and trailing sides may be tapered. Wide adjacent track erasure is minimized while area density capability is maintained. In other embodiments, the HD magnetic material may be one of FeNiM, FeNM, FeCoM, or FeCoNiM where M is a 3d, 4d, or 5d transition metal.