Fremont, CA, United States of America

Fei C Wang

This inventor holds 42 USPTO granted patents and 1 published patent application, primarily in Biometric Technology. Top assignees: Huami Inc., Applied Materials, Inc., Anhui Huami Information Technology Co., Ltd.. Active years: 2008-2024.

USPTO Granted Patents = 42 

% Patents Active = 64.3

Average Co-Inventor Count = 3.5

ph-index = 9

Forward Citations = 507(Granted Patents)


Location History:

  • Newark, CA (US) (2011)
  • Mountain View, CA (US) (2017 - 2020)
  • Fremont, CA (US) (2008 - 2023)
  • Yorktown Heights, NY (US) (2024)

Company Filing History:


Years Active: 2008-2024

Loading Chart...
Areas of Expertise:
Biometric Identification
Wearable Devices
ECG Monitoring
Selective Deposition
Silicon Etching
Cardiac Detection
Patient Data Indexing
Behavioral Dynamics
Lithium Ion Battery
Gas-Phase Etching
Parylene Masks
Document Pagination
42 patents (USPTO):Explore Patents

Title: The Innovative Journey of Fei C Wang

Introduction: Fei C Wang, a talented inventor based in Fremont, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Fei C Wang holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a background in engineering and a passion for problem-solving, Fei C Wang has successfully brought several inventions from concept to reality, revolutionizing industries and improving people's lives.

Collaborations: Throughout his career, Fei C Wang has collaborated with leading research institutions, universities, and tech companies to further develop his inventions and bring them to the market, demonstrating his commitment to innovation and excellence.

Conclusion: Fei C Wang's dedication to innovation and his remarkable contributions to the world of technology make him a standout inventor whose work continues to inspire and shape the future of various industries.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…