Farahmand E Askarinam

Title: Farahmand E Askarinam: Innovator in Plasma Reactor Technology

Introduction

Farahmand E Askarinam is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of plasma reactor technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and functionality of plasma reactors, which are essential in various industrial applications.

Latest Patents

Askarinam's latest patents include innovative designs that improve plasma reactor performance. One of his notable inventions is a plasma reactor featuring an RF power applicator and a dual-purpose window. This invention allows the window electrode to function both as a capacitive electrode and as a means to inductively couple plasma source power into the reactor chamber. Another significant patent is a method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber. This technology utilizes a ceramic igniter array to effectively heat the vacuum chamber, enhancing the processing capabilities for semiconductor wafers.

Career Highlights

Throughout his career, Askarinam has worked with various companies, including Applied Materials, Inc. His experience in the industry has allowed him to develop cutting-edge technologies that address the challenges faced in plasma processing.

Collaborations

Askarinam has collaborated with several professionals in his field, including Kenneth S Collins and Michael Robert Rice. These collaborations have contributed to the advancement of plasma reactor technologies and have fostered innovation in the industry.

Conclusion

Farahmand E Askarinam is a distinguished inventor whose work in plasma reactor technology has led to significant advancements in the field. His patents reflect his commitment to innovation and his contributions continue to impact the industry positively.