Other

Applied Materials, Inc.

Farahmand E Askarinam

Kenneth S Collins

Michael Robert Rice

Douglas A Buchberger, Jr

Craig A Roderick

Tetsuya Ishikawa

Ananda H Kumar

Kwok Manus Wong

In a plasma reactor including a reactor chamber, a workpiece support for holding a workpiece inside the chamber during processing and an inductive antenna, a window electrode proximal a wall of the chamber, the antenna and wall being positioned adjacently, the window electrode being operable as (a) a capacitive electrode accepting RF power to capacitively coupled plasma source power into the chamber, and (b) a window electrode passing RF power therethrough from said antenna into the chamber to inductively couple plasma source power into the chamber.

Plasma reactor having RF power applicator and a dual-purpose window

A vacuum chamber, such as a semiconductor wafer plasma processing chamber, is heated by use of a ceramic igniter array consisting of a plurality of ceramic igniters positioned in a substrate.

Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber

In a plasma reactor including a reactor chamber, a workpiece support for holding a workpiece inside the chamber during processing and an inductive antenna, a window electrode proximal a wall of the chamber, the antenna and wall being positioned adjacently, the window electrode being operable as (a) a capacitive electrode accepting RF power to capacitively coupled plasma source power into the chamber, and (b) a window electrode passing Rf power therethrough from said antenna into the chamber to inductively couple plasma source power into the chamber.

Plasma reactor having a dual mode RF power application

Growing community of inventors

Sunnyvale, CA, United States of America

Farahmand E Askarinam