Company Filing History:
Years Active: 2018-2023
Title: Fangliang Gao: Innovator in Semiconductor Technology
Introduction
Fangliang Gao is a prominent inventor based in Guangzhou, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced epitaxial wafers. With a total of 3 patents to his name, Gao's work is recognized for its innovative approaches and practical applications.
Latest Patents
Gao's latest patents include the "Indium nitride nanopillar epitaxial wafer grown on aluminum foil substrate and preparation method of indium nitride nanopillar epitaxial wafer." This invention details a process for creating an InN nanorod epitaxial wafer that consists of multiple layers, including an aluminum foil substrate, an amorphous aluminum oxide layer, an AlN layer, and an InN nanorod layer. The preparation method involves pretreating the aluminum foil substrate and utilizing a molecular beam epitaxial growth process under specific conditions.
Another notable patent is the "GaAs thin film grown on Si substrate, and preparation method for GaAs thin film grown on Si substrate." This patent outlines a comprehensive method for producing a high-quality GaAs thin film on an Si substrate, which is crucial for semiconductor devices, especially in solar cell applications. The process includes multiple steps, such as substrate cleaning, preprocessing, and the growth of buffer layers, ensuring a good crystal quality and an even surface.
Career Highlights
Fangliang Gao is affiliated with the South China University of Technology, where he continues to advance research in semiconductor materials and their applications. His work has garnered attention for its potential impact on the development of efficient solar cells and other electronic devices.
Collaborations
Gao collaborates with esteemed colleagues, including Guoqiang Li and Lei Wen, who contribute to his research endeavors. Their combined expertise enhances the innovative capacity of their projects and fosters a collaborative environment for technological advancement.
Conclusion
Fangliang Gao stands out as a key figure in semiconductor innovation, with a focus on epitaxial wafer technology. His patents reflect a commitment to advancing the field and addressing the challenges of modern electronics. Through his work at the South China University of Technology, Gao continues to influence the future of semiconductor applications.