The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2020

Filed:

Aug. 18, 2016
Applicant:

South China University of Technology, Guangzhou, CN;

Inventors:

Guoqiang Li, Guangzhou, CN;

Fangliang Gao, Guangzhou, CN;

Lei Wen, Guangzhou, CN;

Shuguang Zhang, Guangzhou, CN;

Jingling Li, Guangzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 25/10 (2006.01); H01L 21/02 (2006.01); C30B 25/10 (2006.01); C30B 25/18 (2006.01); C30B 29/42 (2006.01); H01L 21/324 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02505 (2013.01); C30B 25/10 (2013.01); C30B 25/183 (2013.01); C30B 29/42 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02463 (2013.01); H01L 21/02546 (2013.01); H01L 21/02631 (2013.01); H01L 21/02661 (2013.01); H01L 21/02694 (2013.01); H01L 21/3245 (2013.01); H01L 31/1852 (2013.01);
Abstract

Disclosed is a preparation method for a GaAs thin film grown on an Si substrate, said method comprising the following steps: (1) Si (111) substrate cleaning; (2) Si (111) substrate preprocessing; (3) Si (111) substrate oxide film removal; (4) first InGaAs buffer layer growth; (5) first InGaAs buffer layer in situ annealing; (6) GaAs buffer layer growth; (7) GaAs buffer layer in situ annealing; (8) second InGaAs buffer layer growth; (9) second InGaAs buffer layer in situ annealing; (10) GaAs epitaxial thin film growth. Also disclosed is a GaAs thin film grown on an Si substrate. The GaAs thin film obtained by the present invention has a good crystal quality, an even surface, and a positive promotional significance with regard to the preparation of semiconductor devices, particularly in the field of solar cells.


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