Company Filing History:
Years Active: 2009-2024
Title: Innovations by Fang-Chi Chien
Introduction
Fang-Chi Chien is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of ion implantation technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and reliability of ion implantation systems.
Latest Patents
One of his latest patents is for an insulator for an ion implantation source. This insulator provides electrical insulation between high voltage components and relatively lower voltage components of the ion implantation source. To reduce the likelihood of leakage paths forming along the insulator, it includes an internal cavity with a back and forth pattern. This design increases the mean free path of gas molecules and enhances the surface area of the insulator that is not directly exposed to gas molecules. As a result, it makes the formation of a continuous film or coating along the insulator less likely, thereby extending the working time of the ion implantation source.
Another significant patent is a method and apparatus for reducing vacuum loss in an ion implantation system. This invention includes a transferring system with a vacuum chamber coupled to a processing chamber. It features a shaft coupled to a ball screw, which is configured within the vacuum chamber. Additionally, a vacuum rotary feedthrough with a magnetic fluid seal provides high vacuum sealing and is designed to facilitate rotary motion on the ball screw.
Career Highlights
Fang-Chi Chien is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the semiconductor industry. His work has been instrumental in advancing ion implantation technologies, which are critical for semiconductor manufacturing.
Collaborations
He has collaborated with notable colleagues such as Tsung-Min Lin and Cheng-Yi Huang, contributing to various projects that enhance the capabilities of ion implantation systems.
Conclusion
Fang-Chi Chien's contributions to ion implantation technology through his patents and collaborations highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in this critical field.