The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Jan. 29, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Yu-Feng Han, Hsin-Chu, TW;

Cheng-Yi Huang, Hsin-Chu, TW;

Fang-Chi Chien, Hsinchu, TW;

Chen-shih Chung, Hsin-Chu, TW;

Sheng-Tai Peng, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24B 37/24 (2012.01); B24B 57/02 (2006.01); H01L 21/321 (2006.01); B24B 37/10 (2012.01); B24B 37/013 (2012.01); B24B 37/12 (2012.01); B24B 37/20 (2012.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
B24B 37/042 (2013.01); B24B 37/013 (2013.01); B24B 37/105 (2013.01); B24B 37/12 (2013.01); B24B 37/205 (2013.01); B24B 37/245 (2013.01); B24B 57/02 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01);
Abstract

A stopper includes a head portion sized and configured to be coupled to an upper platen of a chemical-mechanical planarization system and a stopper leg sized and configured to direct a flow of liquid slurry applied to an upper planar surface of the upper platen substantially away from a lower surface of the upper platen.


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