Meylan, France

Fabrice Geiger


Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 548(Granted Patents)


Location History:

  • Meylan, FR (2003 - 2004)
  • St. Nazaire les Eymes, FR (2005)

Company Filing History:


Years Active: 2003-2005

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Innovations of Fabrice Geiger

Introduction

Fabrice Geiger is a notable inventor based in Meylan, France. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving dielectric materials and trench isolation structures, which are crucial for modern electronic devices.

Latest Patents

One of his latest patents is titled "Integration scheme using self-planarized dielectric layer for shallow trench isolation (STI)." This invention outlines a method for forming a trench isolation structure on a substrate. The process involves applying a pad oxide layer on the substrate, followed by a polysilicon layer and a CVD anti-reflective coating. A photoresist is then formed, and a trench is etched at a desired location. This method addresses previous issues with porous trench fill, particularly near trench corners, by utilizing a polysilicon layer to enhance the trench oxide filling layer's properties.

Another significant patent is the "Process for depositing a porous, low dielectric constant silicon oxide film." This invention provides a method for creating a dielectric film with a low dielectric constant, particularly useful as an intermetal dielectric layer. The method involves depositing a porous oxide gap fill layer from a process gas of ozone and TEOS, resulting in a film with a carbon content of at least 5 atomic percent. This high carbon content helps stabilize the layer, making it less susceptible to moisture absorption and outgassing problems.

Career Highlights

Fabrice Geiger is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has significantly impacted the development of advanced materials and processes used in semiconductor manufacturing.

Collaborations

Throughout his career, Fabrice has collaborated with notable colleagues, including Frederic Gaillard and Ellie Y Yieh. These collaborations have contributed to the advancement of innovative technologies in the semiconductor field.

Conclusion

Fabrice Geiger's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His inventions continue to influence the development of advanced electronic devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…