Fa-Chih Liu

Title: Fa-Chih Liu: Innovator in Semiconductor Device Structures

Introduction

Fa-Chih Liu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of advanced semiconductor device structures.

Latest Patents

Fa-Chih Liu holds a patent for the "Structure and formation method of semiconductor device structure." This patent describes a semiconductor device structure that includes a fin structure over a semiconductor substrate. The structure also features an isolation component over the substrate, with the fin structure surrounded by this isolation feature. Additionally, the device includes a gate stack covering the fin structure and a source or drain (S/D) structure that also covers the fin structure. A conductive contact is connected to the S/D structure, comprising a first portion and a second portion, where the second portion extends from the first portion to the S/D structure. The first portion has a width adjoining the second portion, while the second portion has a greater width than the first.

Career Highlights

Fa-Chih Liu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has been instrumental in advancing semiconductor technologies.

Collaborations

Fa-Chih Liu has collaborated with Shih-Ping Hong, contributing to the development of innovative semiconductor solutions.

Conclusion

Fa-Chih Liu's contributions to semiconductor device structures highlight his role as an influential inventor in the technology sector. His patent and work at Taiwan Semiconductor Manufacturing Company Limited demonstrate his commitment to innovation in semiconductor technology.