Company Filing History:
4 out of 641 
1 out of 60 
1 out of 135 
Years Active: 2003-2009
Title: The Innovative Contributions of Evan R Mapoles
Introduction
Evan R Mapoles is a notable inventor based in San Ramon, CA, with a focus on advanced inspection technologies. He holds a total of 6 patents that showcase his expertise in developing systems for detecting defects in complex logic areas.
Latest Patents
One of his latest patents is titled "System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface." This invention describes a dark field surface inspection tool that utilizes an illumination source to scan a light beam onto an inspection surface. The tool captures light scattered from each inspection point as image data through a photo detector array arranged at a fourier plane. The images are adaptively filtered to remove bright pixels, allowing for the detection of defects in the inspection surface. Additionally, the invention includes methods for die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters. Another significant patent is focused on dark field inspection apparatus and methods, which aim to reduce or eliminate long-range ringing responses typically produced by traditional Fourier filter masks. This invention provides an apparatus for inspecting specimens by detecting optical beams scattered from them, ensuring that actual defect components are not subtracted from the output beam.
Career Highlights
Evan has worked with prominent companies in the field, including KLA-Tencor Technologies Corporation and Ultratech Stepper, Inc. His experience in these organizations has contributed to his innovative approach to inspection technologies.
Collaborations
Throughout his career, Evan has collaborated with talented individuals such as Grace Jing Chen and Christopher F Bevis, further enhancing his contributions to the field.
Conclusion
Evan R Mapoles is a distinguished inventor whose work in inspection technologies has led to significant advancements in defect detection methods. His innovative patents and collaborations reflect his commitment to improving the efficiency and accuracy of inspection processes.