This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Carl Zeiss Smt Gmbh, Asml Netherlands B.v.. Active years: 2025-2026.
Company Filing History:
3 out of 1,474 
1 out of 5,065 
Years Active: 2025-2026
Title: Eva Schneider: Innovator in Microlithography
Introduction
Eva Schneider is a prominent inventor based in Aalen, Germany. She has made significant contributions to the field of microlithography, particularly through her innovative patents. With a total of 3 patents, her work has advanced the technology used in projection exposure systems.
Latest Patents
One of her latest patents is a method of setting up a projection exposure system, which includes a projection exposure method and a projection exposure system specifically designed for microlithography. This invention features a measuring system configured to assess a projection radiation property that represents an aberration level at multiple measuring points distributed throughout the image field. Additionally, it incorporates an operating control system with at least one manipulator that is operatively connected to an optical element of the projection exposure system. This allows for the modification of imaging properties based on measurement results generated by the measuring system.
Another notable patent is a method and device for determining the heating state of an optical element in an optical system. This invention is particularly relevant in microlithographic projection exposure systems. It utilizes electromagnetic radiation that impacts the incidence surface of the optical element during operation. By employing a calibration parameter, the average temperature at the incidence surface can be estimated based on temperature measurements taken from a distance.
Career Highlights
Throughout her career, Eva Schneider has worked with esteemed companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. Her experience in these organizations has allowed her to refine her expertise in optical systems and microlithography.
Collaborations
Eva has collaborated with notable professionals in her field, including Vladimir Mitev and Ruediger Mack. These partnerships have contributed to her innovative work and the development of her patents.
Conclusion
Eva Schneider is a trailblazer in the field of microlithography, with her patents reflecting her commitment to advancing technology in projection exposure systems. Her contributions continue to influence the industry and inspire future innovations.