Tokyo, Japan

Etsuharu Tsuchiya

This inventor holds 1 USPTO granted patent. Top assignee: Hd Microsystems, Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Etsuharu Tsuchiya. Retrieved from https://idiyas.com/inventor/etsuharu-tsuchiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Etsuharu Tsuchiya: Innovator in Photosensitive Resin Technology

Introduction

Etsuharu Tsuchiya is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His innovative work has implications for various electronic components and manufacturing processes.

Latest Patents

Tsuchiya holds a patent for a photosensitive resin composition, which includes a polyimide precursor with a polymerizable unsaturated bond, a polymerizable monomer with an aliphatic cyclic skeleton, a photopolymerization initiator, and a solvent. This invention is crucial for the manufacturing of pattern cured products, interlayer insulating films, cover-coat layers, surface protective films, and electronic components. He has 1 patent to his name.

Career Highlights

Etsuharu Tsuchiya is currently employed at Hd Microsystems, Ltd., where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing technologies that rely on photosensitive materials.

Collaborations

Tsuchiya has collaborated with notable colleagues, including Tetsuya Enomoto and Takashi Kawamori, to further enhance the development of advanced materials and technologies.

Conclusion

Etsuharu Tsuchiya's contributions to the field of photosensitive resin technology highlight his role as a key innovator in the industry. His work not only advances scientific understanding but also paves the way for future technological developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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