Location History:
- Atsugi, JP (2014)
- Tochigi, JP (2014)
- Kanagawa, JP (2013 - 2016)
Company Filing History:
Years Active: 2013-2016
Title: The Innovative Contributions of Erika Kato
Introduction
Erika Kato is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. Her work focuses on advanced manufacturing methods that enhance the performance and efficiency of semiconductor devices.
Latest Patents
Among her latest patents are innovative methods for manufacturing semiconductor films and devices. One notable patent describes a method for forming an amorphous semiconductor that contains an impurity element and exhibits low resistivity. This method utilizes a plasma CVD (Chemical Vapor Deposition) technique, where pulse-modulated discharge inception voltage is applied to electrodes. This process is conducted under specific pressure and electrode distance conditions that align with Paschen's Law, ensuring the formation of high-quality amorphous semiconductors. Additionally, her patents include methods for manufacturing semiconductor devices with excellent electrical characteristics and high yield.
Career Highlights
Erika Kato is currently employed at Semiconductor Energy Laboratory Co., Ltd., where she continues to push the boundaries of semiconductor technology. Her innovative approaches have garnered attention in the industry, contributing to advancements in electronic devices.
Collaborations
Throughout her career, Erika has collaborated with esteemed colleagues, including Tetsuhiro Tanaka and Hidekazu Miyairi. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.
Conclusion
Erika Kato's contributions to semiconductor technology exemplify her dedication to innovation and excellence. Her patents not only advance the field but also pave the way for future developments in electronic devices.