Eindhoven, Netherlands

Erik Jansen

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erik Jansen. Retrieved from https://idiyas.com/inventor/erik-jansen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Erik Jansen

Introduction

Erik Jansen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography through his innovative patent. His work is recognized for its impact on the technology used in various industries.

Latest Patents

Erik Jansen holds a patent for a "Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus." This method involves determining a mark measurement sequence for an object with multiple marks. The process includes receiving location data for the marks, obtaining a boundary model of a positioning device, and determining the measurement sequence based on the location data and boundary model.

Career Highlights

Jansen is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His role at ASML allows him to work on cutting-edge technologies that are essential for the advancement of lithographic processes.

Collaborations

Erik has collaborated with talented coworkers, including István Nagy and Özer Duman. Their combined expertise contributes to the innovative projects at ASML.

Conclusion

Erik Jansen's contributions to the field of lithography through his patent and work at ASML highlight his role as an influential inventor. His innovative methods continue to shape the future of technology in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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