Mountain View, CA, United States of America

Erik A De La Iglesia

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erik A De La Iglesia. Retrieved from https://idiyas.com/inventor/erik-a-de-la-iglesia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Innovations by Erik A De La Iglesia

Introduction

Erik A De La Iglesia is a notable inventor based in Mountain View, CA. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on process parameter extraction, which is crucial for enhancing the efficiency of semiconductor fabrication.

Latest Patents

Erik holds 1 patent for a unique invention titled "Process parameter extraction." This invention features an apparatus that includes a test circuit, a first counter, and a second counter. The test circuit is fabricated on a semiconductor substrate to generate an oscillating signal. The frequency of this oscillating signal is dependent on a parameter of the process used to fabricate the test circuit. The first counter measures a time interval, while the second counter counts the number of periods of the oscillating signal during that time interval.

Career Highlights

Erik A De La Iglesia is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His role at Intel allows him to work on cutting-edge technologies that drive innovation in the industry.

Collaborations

One of Erik's notable coworkers is Jason C Stinson. Their collaboration contributes to the advancement of technology within their field.

Conclusion

Erik A De La Iglesia's work exemplifies the spirit of innovation in semiconductor technology. His contributions, particularly in process parameter extraction, highlight the importance of precise measurements in enhancing fabrication processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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