Company Filing History:
Years Active: 2010-2024
Title: Eric Ruhland: Innovator in Vapor Deposition Technology
Introduction
Eric Ruhland is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of vapor deposition technology, holding a total of 3 patents. His work focuses on improving processes and apparatuses used in substrate processing.
Latest Patents
Eric's latest patents include innovative designs that enhance the efficiency and functionality of vapor deposition chambers. One of his key inventions is a seal for an assembly in a vapor deposition chamber. Additionally, he has developed an apparatus and method for a multi-level load lock chamber, transfer chamber, and robot suitable for interfacing with the same. This new apparatus features a multi-level load lock chamber with four environmentally isolated chambers that interface with a transfer chamber equipped with a robotic assembly. The robotic assembly is designed with two arms that can move horizontally while rotating about its axis. This design allows the arms to reach into the isolated chambers of the load lock to receive substrates from the bottom isolated chambers, transport them to process chambers, and place them in the upper chambers. The isolated chambers may also have a pivotably attached lid for easy access.
Career Highlights
Eric Ruhland is currently employed at Applied Materials, Inc., where he continues to innovate and develop advanced technologies in the field. His work has been instrumental in enhancing the capabilities of vapor deposition systems.
Collaborations
Throughout his career, Eric has collaborated with several talented individuals, including Robert B. Moore and Satish Sundar. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Eric Ruhland's contributions to vapor deposition technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His inventions are paving the way for advancements in substrate processing.
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