Applied Materials, Inc.

Eric Ruhland

Satish Sundar

Robert B Moore

Mario David Silvetti

Dien-Yeh Wu

Siamak Salimian

Yao-Hung Yang

Sudhir R Gondhalekar

Aniruddha Pal

Boon Sen Chan

Saurabh M Chaudhari

Scott Lin

Philip Wayne Nagle

Seal for an assembly in a vapor deposition chamber

A new apparatus for processing substrates is disclosed. A multi-level load lock chamber having four environmentally isolated chambers interfaces with a transfer chamber that has a robotic assembly. The robotic assembly has two arms that each can move horizontally as the robotic assembly rotates about its axis. The arms can reach into the isolated chambers of the load lock to receive substrates from the bottom isolated chambers, transport the substrates to process chambers, and then place the substrates in the upper chambers. The isolated chambers in the load lock chamber may have a pivotably attached lid that may be opened to access the inside of the isolated chambers.

Apparatus and method for a multi-level load lock chamber, transfer chamber, and robot suitable for interfacing with same

Multi-level load lock chamber, transfer chamber, and robot suitable for interfacing with same

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Pleasanton, CA, United States of America

Eric Ruhland