Helmond, Netherlands

Eric Maria Geelink

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eric Maria Geelink. Retrieved from https://idiyas.com/inventor/eric-maria-geelink

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Eric Maria Geelink: Revolutionizing Lithographic Technology

Introduction: Eric Maria Geelink, a brilliant inventor based in Helmond, Netherlands, has left an indelible mark in the field of lithographic technology with his groundbreaking patent. His relentless pursuit of innovation has propelled him to the forefront of the industry.

Latest Patents: Eric Maria Geelink holds a noteworthy patent titled "Lithographic apparatus, a device manufacturing method and a device manufactured thereby." This patent introduces a novel method of forming images on a lithographic substrate, revolutionizing the manufacturing process.

Career Highlights: Eric Maria Geelink is a key figure at ASML Netherlands B.V., a leading company in the lithography sector. His expertise and creative solutions have significantly contributed to the company's success in pushing the boundaries of technological advancement.

Collaborations: In his professional journey, Eric Maria Geelink has collaborated closely with esteemed colleagues such as Melle Cornelis Geers and Enno Van Den Brink. Together, they have synergized their talents to drive innovation and achieve remarkable results in the field.

Conclusion: Eric Maria Geelink's ingenuity and dedication to advancing lithographic technology have cemented his reputation as a visionary inventor. His patent stands as a testament to his exceptional skills and the transformative impact he continues to have on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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