The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2010

Filed:

Aug. 24, 2006
Applicants:

Melle Cornelis Geers, Maastricht, NL;

Enno Van Den Brink, Eindhoven, NL;

Eric Maria Geelink, Helmond, NL;

Inventors:

Melle Cornelis Geers, Maastricht, NL;

Enno Van Den Brink, Eindhoven, NL;

Eric Maria Geelink, Helmond, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.


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