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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Eric Hollar

This inventor holds 4 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eric Hollar. Retrieved from https://idiyas.com/inventor/eric-hollar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4

% Patents Active = 25.0

Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 58(Granted Patents)


Company Filing History:

goldMedal4 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 2006-2026

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4 patents (USPTO):Explore Patents
1. 12685095 - In-situ integrated wafer parameter detection system with remote plasma cleaning (2026-07-14),
2. 7422774 - Method for forming ultra low k films using electron beam (2008-09-09),
3. 7060330 - Method for forming ultra low k films using electron beam (2006-06-13),
4. 7056560 - Ultra low dielectric materials based on hybrid system of linear silicon precursor and organic porogen by plasma-enhanced chemical vapor deposition (PECVD) (2006-06-06),

Title: The Innovative Journey of Eric Hollar

Introduction: Eric Hollar, a talented inventor based in Cupertino, CA, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Eric Hollar's latest patents focus on advancements in artificial intelligence, particularly in the fields of machine learning and data analytics.

Career Highlights: With a career spanning over two decades, Eric Hollar has worked with leading tech companies in Silicon Valley, playing a key role in the development of cutting-edge technologies.

Collaborations: Throughout his career, Eric Hollar has collaborated with top researchers and engineers, fostering a culture of innovation and pushing the boundaries of what is possible in the tech industry.

Conclusion: Eric Hollar's passion for innovation and his dedication to pushing the limits of technology make him a true pioneer in the field of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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