Eric Chin Hong Ng

Title: The Innovative Contributions of Eric Chin Hong Ng

Introduction

Eric Chin Hong Ng is a notable inventor based in Milpitas, California. He has made significant contributions to the field of imaging metrology and substrate processing. With a total of three patents to his name, Ng's work has advanced the understanding and application of optical metrology in various industries.

Latest Patents

One of Ng's latest patents is titled "Spatial pattern loading measurement with imaging metrology." This method involves identifying first structure data of a substrate's first region and receiving optical metrology data associated with substrate deposition processes. The method determines a first growth rate of the substrate's first region and predicts thickness data of a second region without needing second structure data. Another significant patent is "Surface roughness and emissivity determination." This system includes a radiation source that emits a radiation beam and two optical sensors that detect intensities of the reflected and scattered radiation. The processing device then determines the roughness or emissivity of the object's surface based on the comparison of these intensities.

Career Highlights

Ng has worked with prominent companies such as Applied Materials, Inc. and Applied Materials Israel Limited. His experience in these organizations has allowed him to develop and refine his innovative techniques in metrology and substrate processing.

Collaborations

Some of Ng's notable coworkers include Todd J. Egan and Mehdi Vaez-Iravani. Their collaborative efforts have contributed to the advancements in the technologies they have worked on together.

Conclusion

Eric Chin Hong Ng's innovative patents and career achievements highlight his significant impact on the field of imaging metrology. His work continues to influence the industry and pave the way for future advancements.