The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2024

Filed:

Sep. 29, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Eric Chin Hong Ng, Milpitas, CA (US);

Todd J. Egan, Fremont, CA (US);

Mehdi Vaez-Iravani, Los Gatos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01); G01J 5/00 (2022.01); G01J 5/0806 (2022.01); G01J 5/0808 (2022.01);
U.S. Cl.
CPC ...
G01B 11/303 (2013.01); G01J 5/0003 (2013.01); G01J 5/0806 (2013.01); G01J 5/0808 (2022.01);
Abstract

A system includes a radiation source configured to emit a radiation beam. The system further includes a first optical sensor configured to detect a first intensity of a first portion of the radiation beam reflected from a surface of an object. The system further includes a second optical sensor configured to detect a second intensity of a second portion of the radiation beam scattered by the surface of the object. The system further includes a processing device communicatively coupled to the first optical sensor and the second optical sensor. The processing device is configured to determine at least one of a roughness or an emissivity of the surface of the object based on a comparison of the first intensity and the second intensity.


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