Company Filing History:
Years Active: 2020-2021
Title: Er Jiang Xu: Innovator in Epitaxial Growth Technologies
Introduction
Er Jiang Xu is a prominent inventor based in Hubei, China. He has made significant contributions to the field of epitaxial growth technologies. With a total of 2 patents, his work focuses on solving complex challenges in patterned devices.
Latest Patents
Er Jiang Xu's latest patents include innovative methods for addressing the epitaxial growth loading effect at different pattern density regions. One of his methods involves forming a first trench and a second trench in a substrate and in a first insulating layer over the substrate. This process creates a low pattern density region and a high pattern density region. The first trench has a larger cross-sectional area than the second trench. The method further includes isolating the first trench from the second trench using a first mask and disposing a second insulating layer in the first trench. Additionally, a portion of the first mask is removed to expose the second trench, allowing for the growth of an epitaxial layer in the second trench.
Another patent describes methods and patterned devices aimed at reducing the loading effect between low and high pattern density regions. The patterned device consists of a substrate, a first insulating layer, a low pattern density region, a high pattern density region, a second insulating layer, and an epitaxial grown layer. The low pattern density region includes a first trench in the first insulating layer and the substrate, while the high pattern density region includes a second trench. The second insulating layer is formed in the first trench, and the epitaxial grown layer is formed in the second trench, with the first trench having a larger cross-sectional area than the second trench.
Career Highlights
Er Jiang Xu is currently employed at Yangtze Memory Technologies Co., Ltd. His work at this company has allowed him to further develop his expertise in the field of semiconductor technologies.
Collaborations
He has collaborated with notable coworkers, including Zhen Fang and Haihui Huang, contributing to various projects and innovations in the industry.
Conclusion
Er Jiang Xu is a key figure in the advancement of epitaxial growth technologies, with a focus on improving device performance through innovative methods. His contributions continue to impact the field significantly.