Givat Elah, Israel

Ephie Koltin


Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 473(Granted Patents)


Location History:

  • Givat Ela, IL (2001)
  • Givat Elah, IL (2001)

Company Filing History:


Years Active: 2001

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4 patents (USPTO):Explore Patents

Title: **Ephie Koltin: Pioneering Innovations in Semiconductor Technology**

Introduction

Ephie Koltin, an accomplished inventor based in Givat Elah, Israel, has made significant contributions to the field of semiconductor technology with four patents to her name. Her innovative approach to designing interconnect layers and enhancing CMOS image sensors showcases her expertise and forward-thinking mindset in the industry.

Latest Patents

Koltin’s most recent patents include a groundbreaking method for stitching design rules for forming interconnect layers. This process involves defining cut regions on mask regions and implementing design rules that lead to improved trace patterns, ensuring high precision and operational efficiency in semiconductor manufacturing. Her work lays the foundation for more effective and robust interconnect designs.

Another notable patent is the method and structure for minimizing white spots in CMOS image sensors. This innovation focuses on stress reduction in light-sensitive regions, resulting in lower leakage currents and enhanced image quality in CMOS sensors. By carefully manipulating the structure of the field oxide and ensuring the correct spatial arrangements, Koltin has addressed common challenges in sensor technology, leading to significant improvements.

Career Highlights

Ephie Koltin has built her career at Tower Semiconductor Ltd., a leader in the semiconductor manufacturing industry. Her role in this company has allowed her to implement her inventive ideas and realize the practical applications of her research. With a proactive approach to problem-solving, she has established herself as a key player in the development of innovative semiconductor solutions.

Collaborations

Throughout her journey, Koltin has collaborated with esteemed colleagues in her field, including Yacov Malinovich and Yossi Netzer. These partnerships have enabled her to expand her knowledge and leverage different perspectives to enhance her inventions. Together, they contribute to the advancing technology and capabilities within Tower Semiconductor.

Conclusion

In summary, Ephie Koltin represents a new generation of inventors whose contributions significantly impact the semiconductor industry. With her impressive patent portfolio and collaborative spirit, she continues to pave the way for innovations that drive technological advancement. Her work not only addresses current challenges but also sets the stage for future developments in semiconductor technology.

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