This inventor holds 2 USPTO granted patents. Top assignee: Intel Corporation. Active years: 1988.
Company Filing History:
Years Active: 1988
Title: Ender Hokelek: Innovator in Semiconductor Technology
Introduction
Ender Hokelek is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of semiconductor technology. With a focus on enhancing the performance of metal oxide semiconductor field-effect transistors (MOSFETs), Hokelek has been instrumental in developing innovative techniques that improve device efficiency and reliability. He holds 2 patents that showcase his expertise and commitment to advancing technology.
Latest Patents
Hokelek's latest patents include a "Source Drain Doping Technique" and a "Method of Fabricating a MOSFET with Graded Source and Drain Regions." The source drain doping technique describes a method of forming complementary metal oxide semiconductor field-effect transistors (CMOSFET) wherein the source and drain regions are disposed by ion implantation in a manner substantially perpendicular to the substrate surface in two steps. This method ensures that the concentration of impurities increases with lateral distance away from the gate electrode member, effectively suppressing hot electron injection, preventing channeling effects, increasing punch-through voltage, and enhancing gate-aided breakdown voltage. Similarly, the method of fabricating a MOSFET with graded source and drain regions employs a comparable approach to improve the performance of MOSFETs.
Career Highlights
Ender Hokelek is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to collaborate with some of the brightest minds in the industry, contributing to groundbreaking advancements in technology.
Collaborations
Hokelek has worked alongside esteemed colleagues such as Been-Jon K Woo and Mark A Holler, further enriching his experience and expertise in the field.
Conclusion
Ender Hokelek's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of more efficient and reliable electronic devices.