Espoo, Finland

Emma Salmi

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Beneq Oy. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Emma Salmi. Retrieved from https://idiyas.com/inventor/emma-salmi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Emma Salmi: Semiconductor Doping Innovation.

Introduction

Emma Salmi is an inventor associated with Espoo, Finland, and Beneq Oy. Her patent work addresses semiconductor doping, a process used to modify the electrical properties of semiconductor materials.

Latest Patents

The available information identifies one patent associated with Salmi: “Semiconductor Doping Method and an Intermediate Semiconductor Device.” The invention describes depositing a separation layer on a substrate, followed by a mixture material source layer containing a dopant. The substrate and deposited layers are then annealed to promote diffusion of the dopant from the source layer into both the substrate and the separation layer. This sequence presents a method for controlling dopant introduction during semiconductor processing. Salmi is associated with 1 patent.

Career Highlights

Salmi’s listed patent reflects work on semiconductor fabrication and doping techniques. The available information connects her invention to Beneq Oy, but does not provide further details about her role or career history.

Collaborations

The listed coworkers associated with Salmi are Erik Östreng and Katja Väyrynen. Their names provide context for the professional network connected with her work, though the available information does not specify their contributions to the patent.

Conclusion

Emma Salmi’s patent describes a layered approach to semiconductor doping that uses annealing to diffuse dopant material into a substrate and separation layer.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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