Company Filing History:
Years Active: 2019
Title: Eliav Benisty: Innovator in Near Field Metrology
Introduction
Eliav Benisty is a notable inventor based in Migdal Haemek, Israel. He has made significant contributions to the field of metrology, particularly through his innovative patent related to near field metrology systems.
Latest Patents
Eliav Benisty holds a patent for a system that enhances the measurement capabilities of optical elements. His patent, titled "Near field metrology," describes metrology systems and methods that include an optical element positioned between an objective lens and a target. This optical element is designed to enhance evanescent modes of radiation reflected by the target. The patent outlines various configurations, including solid immersion lenses, combinations of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are adaptable to various types of metrology, including imaging and scatterometry methods. Eliav has 1 patent to his name.
Career Highlights
Eliav Benisty is currently employed at KLA-Tencor Corporation, where he continues to work on advancing metrology technologies. His expertise in optical systems and metrology has positioned him as a valuable asset in the field.
Collaborations
Eliav collaborates with talented individuals such as Noam Sapiens and Joel L. Seligson, contributing to innovative projects and advancements in metrology.
Conclusion
Eliav Benisty's work in near field metrology showcases his innovative spirit and dedication to enhancing measurement technologies. His contributions are significant in the realm of optical systems, and his patent reflects his expertise and commitment to advancing the field.