Kla Tencor Corporation

Eliav Benisty

Amnon Manassen

Vladimir Levinski

Daniel Kandel

Yoel Feler

Noam Sapiens

Barak Bringoltz

Joel L Seligson

Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moir&#xe9;-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.

Near field metrology

Growing community of inventors

Migdal Haemek, Israel

Eliav Benisty