Location History:
- Komae, JP (2012 - 2014)
- Kawasaki, JP (2018)
Company Filing History:
Years Active: 2012-2018
Title: Innovations of Eisaku Watanabe
Introduction
Eisaku Watanabe is a notable inventor based in Komae, Japan. He has made significant contributions to the field of electronic components and noble metal film technology. With a total of 5 patents to his name, Watanabe's work has had a considerable impact on the industry.
Latest Patents
Watanabe's latest patents include a method for continuously forming noble metal film and a method for continuously manufacturing electronic components. The first patent aims to prevent a drop in secondary electron emission characteristics caused by the inner wall of a chamber being covered by a noble metal film formed through plasma sputtering. This innovation helps generate and maintain plasma effectively. The second patent addresses the issue of film thickness distribution during the sputter method. It ensures that variations due to target erosion are suppressed, allowing for optimal film thickness and resistance value distribution.
Career Highlights
Eisaku Watanabe is currently employed at Canon Anelva Corporation, where he continues to develop innovative technologies. His work has been instrumental in advancing the capabilities of electronic components and manufacturing processes.
Collaborations
Watanabe has collaborated with several talented individuals, including Tetsuro Ogata and Hanako Hirayama. These partnerships have contributed to the success of his projects and the advancement of technology in their field.
Conclusion
Eisaku Watanabe's contributions to the field of electronic components and noble metal film technology highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving complex challenges in manufacturing processes.