The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Dec. 10, 2012
Applicant:
Canon Anelva Corporation, Kawasaki-shi, JP;
Inventors:
Shunichi Wakayanagi, Kawasaki, JP;
Eisaku Watanabe, Kawasaki, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/56 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/14 (2013.01); C23C 14/0036 (2013.01); C23C 14/34 (2013.01); C23C 14/351 (2013.01); C23C 14/56 (2013.01); H01J 37/32477 (2013.01); H01J 37/34 (2013.01); H01J 37/3426 (2013.01);
Abstract
The purpose of the present invention is to prevent a drop in secondary electron emission characteristics due to the inside wall of a chamber being covered by a noble metal film continuously formed by plasma sputtering, and so generate and maintain the plasma. After a noble metal film is formed on a given substrate and before a film is formed on a subsequent substrate, a secondary electron emission film comprising a material having a secondary electron emission coefficient higher than that of the noble metal is formed on the inner wall of the chamber.