Eiji Sawa

Title: Eiji Sawa: Innovator in Photomask Technology

Introduction

Eiji Sawa, an accomplished inventor based in Yokohama, Japan, has made significant contributions to the field of photomask technology with a total of 12 patents to his name. His inventions have streamlined the processes involved in pattern characteristic detection and inspection systems, showcasing his expertise and innovative approach.

Latest Patents

One of Sawa's latest patents includes a "Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask." This invention involves a detection-data creating portion that generates detection data based on an optical image of a pattern on a photomask. It also features a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion, and a collecting portion, all contributing to the efficiency of pattern characteristic detection.

Another notable patent is related to an "Inspection system and method for inspecting line width and/or positional errors of a pattern." This encompasses a detailed method for imaging an object and comparing its optical image with design pattern data, allowing for precise measurements of discrepancies in line width and positional errors between the inspected object and reference images.

Career Highlights

Throughout his career, Eiji Sawa has worked for notable companies, including Bridgestone Corporation and Kabushiki Kaisha Toshiba, where he has contributed his insights and innovations to enhance their product offerings and manufacturing processes.

Collaborations

Sawa has collaborated with talented individuals such as Hiromu Inoue and Hiroya Fukuda, pooling their expertise to advance the fields of photomask technology and inspection systems. These collaborations have been crucial in developing specialized solutions for complex engineering challenges.

Conclusion

Eiji Sawa stands out as a distinguished inventor whose contributions to photomask technology are paving the way for advancements in manufacturing processes. His innovative solutions, characterized by sophisticated detection and inspection methodologies, solidify his reputation as a key player in the engineering domain.