Eiji Ikegami

Title: Eiji Ikegami: Innovator in Plasma Processing Technology

Introduction

Eiji Ikegami is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of plasma processing methods.

Latest Patents

One of Eiji Ikegami's latest patents is a plasma processing method and apparatus designed for the processing of multiple substrates. This innovative apparatus includes a plasma processing chamber equipped with an antenna electrode and a lower electrode for placing and retaining the substrates. The system features a gas feeder for introducing processing gas, a vacuum pump for discharging gas, and a solenoid coil for creating a magnetic field within the chamber. The process involves placing at least one substrate on the lower electrode, feeding processing gas, and applying RF power to generate plasma. This cycle is repeated until all substrates are processed, with the end of seasoning determined by the stabilization of internal pressure within the chamber.

Career Highlights

Eiji Ikegami has been associated with Hitachi High-Technologies Corporation, where he has contributed to advancements in plasma processing technology. His expertise in this area has positioned him as a key figure in the development of innovative solutions for industrial applications.

Collaborations

Throughout his career, Eiji has collaborated with notable colleagues, including Shoji Ikuhara and Takeshi Shimada. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Eiji Ikegami's contributions to plasma processing technology highlight his role as a leading inventor in this field. His patents reflect a commitment to advancing technology and improving industrial processes.