Kawasaki, Japan

Eiichi Shimura

USPTO Granted Patents = 3 

Average Co-Inventor Count = 1.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016-2023

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3 patents (USPTO):Explore Patents

Title: Eiichi Shimura: Innovator in Resist Technology

Introduction

Eiichi Shimura is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist technology, particularly in the development of methods for forming resist patterns and photosensitive resin layers. With a total of 3 patents to his name, Shimura's work has had a notable impact on the industry.

Latest Patents

Shimura's latest patents include innovative methods that enhance the efficiency and effectiveness of resist compositions. One of his key patents is a method of forming a resist pattern, which involves creating a resist composition using a resist film, exposing the film, and alkali-developing it to form a positive-tone resist pattern. This method utilizes a specific relationship between the dissolution rates of two resin components, ensuring optimal performance in the development process. Another significant patent focuses on forming a photosensitive resin layer that includes a chemically amplified positive-type photosensitive resin composition. This composition generates an acid upon light exposure and heating, which increases its solubility in alkali, thereby improving the quality of the resulting photoresist pattern.

Career Highlights

Eiichi Shimura is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work at the company has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to resist technology.

Collaborations

Throughout his career, Shimura has worked alongside notable colleagues such as Yasushi Washio and Tomoyuki Ando. These collaborations have fostered a creative environment that has led to the development of innovative solutions in resist technology.

Conclusion

Eiichi Shimura's contributions to the field of resist technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence advancements in the semiconductor industry, showcasing the importance of innovation in technology.

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