The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11754926 B1

Date of Patent:

Sep. 12, 2023

Filed:

Nov. 08, 2019

Method of forming resist pattern, resist composition and method of producing the same

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventor:

Eiichi Shimura, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe, Martens, Olson & Bear, LLP

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.

CPC ...

G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); C08L 65/02 (2006.01); C08L 33/02 (2006.01); C08L 33/14 (2006.01);

U.S. Cl.

CPC ...

G03F 7/325 (2013.01); C08L 33/02 (2013.01); C08L 33/14 (2013.01); C08L 65/02 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01);

Abstract

A method of forming a resist pattern, including forming a resist composition using a resist film; exposing the resist film; and alkali-developing the exposed resist film to form a positive-tone resist pattern, wherein the resist composition includes a first resin component and a second resin component which satisfies a specific relationship DR<DRand DR<DR, wherein DRis the dissolution rate of the first resin component (P1) in an alkali developing solution, DRis the dissolution rate of the second resin component (P2) in an alkali developing solution, and DRis the dissolution rate of a mixed resin of the first resin component (P1) and the second resin component (P2).

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