Shizuoka, Japan

Eiichi Mizuno

This inventor holds 1 USPTO granted patent. Top assignee: Ulvac, Inc.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiichi Mizuno. Retrieved from https://idiyas.com/inventor/eiichi-mizuno-w5lrme8p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Eiichi Mizuno in Tungsten Nitride Film Technology

Introduction

Eiichi Mizuno, an accomplished inventor based in Shizuoka, Japan, has made significant strides in the field of materials science. Notably, he is recognized for his innovative work in developing a method for forming tungsten nitride films, a process crucial for various applications in semiconductor manufacturing and other advanced technologies.

Latest Patents

Mizuno holds a patent for a detailed method of forming a tungsten nitride film. This method involves several steps: the initial supply of a tungsten compound gas, a reduction step utilizing a reducing gas, followed by a second supply of tungsten compound gas, and finally, a nitridation step involving a nitriding gas. A key feature of this process is how it separates the deposition of tungsten and the formation of tungsten nitride, allowing for precise control over the quantities of each substance by adjusting gas flow rates, pressures, and the timing or sequence of each step.

Career Highlights

Eiichi Mizuno is associated with Ulvac, Inc., a company renowned for its advancements in vacuum technology and material processing. Through his work, Mizuno has contributed to the ongoing development of innovative materials that are essential for high-tech applications. His research has enabled better efficiency and control in manufacturing processes, underlining his importance in the field.

Collaborations

Throughout his career, Mizuno has collaborated with esteemed peers such as Narishi Gonohe and Masamichi Harada. These collaborations have further enhanced his research capabilities and broadened the impact of his contributions to the field of materials science.

Conclusion

Eiichi Mizuno's innovative work in developing a method for tungsten nitride film formation showcases his dedication to advancing technology in semiconductor manufacturing. His contributions not only demonstrate his expertise but also highlight the importance of collaboration in achieving breakthroughs in scientific research. As he continues his work at Ulvac, Inc., Mizuno stands as a testament to the vital role inventors play in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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