Eiich Hayano

Title: Eiich Hayano: Innovator in High Frequency Power Supply Technology

Introduction

Eiich Hayano is a notable inventor based in Osaka, Japan. He is recognized for his contributions to the field of high frequency power supply devices. His innovative work has led to the development of technology that enhances the generation of plasmas.

Latest Patents

Eiich Hayano holds a patent for a high frequency power supply device and power supplying method. This invention allows for rapid and accurate control of power used in plasma generation. The device features a first high frequency power supply that operates at frequency f, and a second high frequency power supply that operates at a higher frequency. The first power supply includes a high frequency oscillator with a variable frequency, a power amplification block, a heterodyne detection block, and a control block that manages the oscillating frequency and output.

Career Highlights

Throughout his career, Eiich Hayano has worked with several prominent companies. He has been associated with Pearl Kogyo Co., Ltd. and Advanced Micro-fabrication Equipment Inc. in Shanghai. His experience in these organizations has contributed to his expertise in high frequency technologies.

Collaborations

Eiich Hayano has collaborated with notable professionals in his field, including Takeshi Nakamura and Yasunori Maekawa. These collaborations have furthered his research and development efforts in high frequency power supply systems.

Conclusion

Eiich Hayano's innovative contributions to high frequency power supply technology have made a significant impact in the field of plasma generation. His patent and career achievements reflect his dedication to advancing this important area of research.