Advanced Micro-fabrication Equipment Inc, Shanghai

Pearl Kogyo Co., Ltd.

Eiich Hayano

Takeshi Nakamura

Jinyuan Chen

Hiroshi Iizuka

Yasunori Maekawa

A high frequency power supply device and power supplying method are disclosed, which can rapidly and accurately control power used for generation of plasmas. The device includes a first high frequency power supply, providing power at frequency f, and a second high frequency power supply providing power at frequency f(f&#x3e;f). The first power supply includes: a first high frequency oscillator, which excites the high frequency power at the first frequency and has a variable frequency; a first power amplification block, which amplifies the power of the high frequency oscillator; a heterodyne detection block, which performs heterodyne detection of a reflected wave; and a first control block, which receives a signal after detection of the heterodyne detection block and a traveling wave signal, and controls an oscillating frequency of the first high frequency oscillating block and an output of the first power amplification block.

Growing community of inventors

Osaka, Japan

Eiich Hayano