The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Jun. 19, 2015
Pearl Kogyo Co., Ltd., Osaka, JP;
Advanced Micro-fabrication Equipment Inc, Shanghai, Shanghai, CN;
Eiich Hayano, Osaka, JP;
Takeshi Nakamura, Osaka, JP;
Yasunori Maekawa, Osaka, JP;
Hiroshi Iizuka, Shanghai, CN;
Jinyuan Chen, Shanghai, CN;
PEARL KOGYO CO., LTD., Osaka, JP;
ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI, Shanghai, CN;
Abstract
A high frequency power supply device and power supplying method are disclosed, which can rapidly and accurately control power used for generation of plasmas. The device includes a first high frequency power supply, providing power at frequency f, and a second high frequency power supply providing power at frequency f(f>f). The first power supply includes: a first high frequency oscillator, which excites the high frequency power at the first frequency and has a variable frequency; a first power amplification block, which amplifies the power of the high frequency oscillator; a heterodyne detection block, which performs heterodyne detection of a reflected wave; and a first control block, which receives a signal after detection of the heterodyne detection block and a traveling wave signal, and controls an oscillating frequency of the first high frequency oscillating block and an output of the first power amplification block.