Edward Muzio

Title: Edward Muzio and His Patent for a Dual-Member Pellicle Assembly.

Introduction

Edward Muzio is an inventor associated with Rio Rancho, New Mexico, and Intel Corporation. His patent work addresses equipment used to protect photomasks during semiconductor photolithography.

Latest Patents

Muzio is credited with 1 patent, titled “Dual-member pellicle assemblies and methods of use.” The invention describes an assembly designed to protect a photomask during photolithography at wavelengths inside or outside the visible spectrum. It includes a base member aligned with the photomask and a removable upper member consisting of a pellicle frame coupled to a pellicle sheet, which may be transparent or opaque.

The frame can be detached from the base and moved out of the exposure path. Securing options include magnets, mating bevels, and interlocking male and female members. Handles or recesses may also help users detach or move the assembly. The patent further describes methods for using the assembly.

Career Highlights

Muzio’s listed patent reflects work on photolithography equipment and photomask protection, areas relevant to semiconductor manufacturing. He is associated with Intel Corporation.

Collaborations

Jerry C. Cullins is identified as Muzio’s coworker. The supplied information does not specify whether Cullins was a co-inventor or collaborator on the patent.

Conclusion

Edward Muzio’s patent describes a removable, dual-member pellicle assembly intended to protect photomasks while allowing the pellicle frame to be moved out of the exposure path.