The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Apr. 23, 2001
Edward Muzio, Rio Rancho, NM (US);
Jerry C. Cullins, Austin, TX (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths either within or outside the visible spectrum include a pellicle that is removed during exposure. The pellicle sheet can be transparent or opaque. In one embodiment, a pellicle assembly comprises a base member aligned with a photomask, and an upper member in the form of a pellicle frame coupled to a pellicle sheet. The pellicle frame can be removed from the exposure path. When overlying the base member, the pellicle frame can be secured to it with a securing mechanism such as magnets, mating bevels, or mating male and female members. Detaching and handling elements, such as handles and/or recesses, can be provided to detach the pellicle frame from the base member and/or to move the pellicle assembly. Methods of using a pellicle assembly are also described.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile