Eddy Chiang

Title: Eddy Chiang: Innovator in Semiconductor Technology

Introduction

Eddy Chiang is a prominent inventor based in Taouan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have paved the way for advancements in contact hole treatment and etching methods.

Latest Patents

Eddy's latest patents include a method of forming contact using a non-conformal dielectric liner. This method provides a new way to treat contact holes after their formation. A layer of non-conformal dielectric is deposited over the surface, including the sidewalls and bottom of the contact hole. This results in a lighter deposition along the lower portions and a heavier coating along the upper reaches, effectively preventing the enlargement of the hole diameter during subsequent processing steps. Additionally, he has developed a multiple etch contact etching method that incorporates post-contact etch etching. This method allows for the formation of a via through a silicon oxide layer while preserving the integrity of the patterned silicon nitride layer.

Career Highlights

Eddy Chiang is currently employed at Vanguard International Semiconductor Corporation, where he continues to innovate in semiconductor processes. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing techniques.

Collaborations

Eddy collaborates with notable colleagues such as Erik S. Jeng and Tzu-Shih Yen, contributing to a dynamic and innovative work environment.

Conclusion

Eddy Chiang's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.