The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2001
Filed:
Sep. 05, 2000
Applicant:
Inventors:
Tzu-Shih Yen, Hsin-Chu, TW;
Erik S. Jeng, Hsin-Chu, TW;
Hsiao-Chin Tuan, Hsin-Chu, TW;
Chun-Yao Chen, Hsin-Chu, TW;
Eddy Chiang, Tao-Yuan, TW;
Wen-Shiang Liao, Miao-Li, TW;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract
A method for forming self-aligned contact (SAC) is disclosed to improve device reliability. The method includes forming a dielectric liner over the contact opening before the contact plug is filled in. Optional contact implantation before and after the liner formation can be added to enhance the doping profile of the device.
Yen, Tzu-Shih. (2001). Method for forming self-aligned contact with liner (U.S. Patent No. 6306759). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6306759
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile