This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Ed Ma - Innovator in Illumination Systems
Introduction
Ed Ma is a notable inventor based in Alameda, California. He has made significant contributions to the field of illumination systems, particularly in the area of reticle inspection. His innovative approach has led to the development of a unique patent that enhances the efficiency of illumination systems.
Latest Patents
Ed Ma holds a patent for "Multiplexing EUV sources in reticle inspection." This patent describes an illumination system that includes a base member rotatable about a rotation axis and a plurality of mirrors disposed on its outer surface. The mirrors are oriented at a predetermined angle and are designed to receive radiation from multiple illumination sources. This innovative design allows for improved optical paths, enhancing the performance of reticle inspection processes.
Career Highlights
Ed Ma is currently employed at Kla Tencor Corporation, where he continues to work on cutting-edge technologies in the field of illumination systems. His expertise and innovative mindset have made him a valuable asset to the company.
Collaborations
Throughout his career, Ed has collaborated with talented individuals such as Daniel C Wack and Daimian Wang. These collaborations have contributed to the advancement of technology in their respective fields.
Conclusion
Ed Ma's contributions to illumination systems through his patent and work at Kla Tencor Corporation highlight his role as an influential inventor. His innovative solutions continue to shape the future of reticle inspection technology.