Herborn, Germany

Eberhard Schultheiss

This inventor holds 2 USPTO granted patents. Top assignee: Leybold Aktiengesellschaft. Active years: 1990-1992.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1990-1992

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2 patents (USPTO):Explore Patents

Title: Eberhard Schultheiss: Innovator in Magnetron Technology

Introduction

Eberhard Schultheiss is a notable inventor based in Herborn, Germany. He has made significant contributions to the field of magnetron technology, holding 2 patents that showcase his innovative approach to sputtering cathode arrangements and data carrier fabrication.

Latest Patents

His latest patents include a sputtering cathode arrangement according to the magnetron principle for coating flat circular substrates. This invention features a circular ring-shaped target and a unique arrangement of masks that enhance the uniformity of the coating process. Additionally, he has developed a method and apparatus for fabricating magneto-optical, storable, and deletable data carriers. This technology allows for precise control over the composition of layers applied to substrates, ensuring high-quality data storage solutions.

Career Highlights

Eberhard Schultheiss is associated with Leybold Aktiengesellschaft, a company known for its advancements in vacuum technology and thin film deposition. His work has been instrumental in pushing the boundaries of what is possible in magnetron sputtering systems.

Collaborations

Throughout his career, Schultheiss has collaborated with esteemed colleagues such as Peter Wirz and Guenter Braeuer. These partnerships have fostered an environment of innovation and have contributed to the success of his projects.

Conclusion

Eberhard Schultheiss stands out as a key figure in the development of magnetron technology, with his patents reflecting a commitment to advancing the field. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
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